MANN GCA DSW 4800 Wafer Stepper

EXPO COMMAND

The EXPO command is used to determine the best focus and exposure settings (in ROW mode) or the best exposure setting (in ARRAY mode). EXPO uses any pre-existing job file for its initial setup, and then prompts the operator for additional parameters which are specific to running a focus/exposure matrix.

ROW MODE
Exposure and focus can be incremented over the matrix. The following table exhibits row mode for starting exposure of 6.0 incremented by 0.5 and starting focus of 248 incremented by 1.0. 

 ROWS                  COLUMNS
        1    2    3    4    5    6    7    8
        -    -    -    -    -    -    -    -
  1  -  6   6.5   7   7.5   8   8.5   9   9.5      <---focus 248
  2  -  6   6.5   7   7.5   8   8.5   9   9.5      <---focus 249
  3  -  6   6.5   7   7.5   8   8.5   9   9.5      <---focus 250
  4  -  6   6.5   7   7.5   8   8.5   9   9.5      <---focus 251
  5  -  6   6.5   7   7.5   8   8.5   9   9.5      <---focus 252
  6  -  6   6.5   7   7.5   8   8.5   9   9.5      <---focus 253
  7  -  6   6.5   7   7.5   8   8.5   9   9.5      <---focus 254
  8  -  6   6.5   7   7.5   8   8.5   9   9.5      <---focus 255
ARRAY MODE
Exposure but not focus can be incremented over the matrix. The following table exhibits array mode for starting exposure of 4.0 incremented by 0.1 and focus of 248. Array mode does not prompt for focus increment. 
 ROWS                  COLUMNS
        1    2    3    4    5    6    7    8
        -    -    -    -    -    -    -    -
  1  - 4.0  4.1  4.2  4.3  4.4  4.5  4.6  4.7      <---focus 248
  2  - 5.5  5.4  5.3  5.2  5.1  5.0  4.9  4.8      <---focus 248
  3  - 5.6  5.7  5.8  5.9  6.0  6.1  6.2  6.3      <---focus 248
  4  - 7.1  7.0  6.9  6.8  6.7  6.6  6.5  6.4      <---focus 248
  5  - 7.2  7.3  7.4  7.5  7.6  7.7  7.8  7.9      <---focus 248
  6  - 8.7  8.6  8.5  8.4  8.3  8.2  8.1  8.0      <---focus 248
  7  - 8.8  8.9  9.0  9.1  9.2  9.3  9.4  9.5      <---focus 248
  8  - 10.3 10.2 10.1 10.0 9.9  9.8  9.7  9.6      <---focus 248
The job file must be matched to the reticle used for the matrix. The job parameters should be: WAFER
Use a 3 inch silicon wafer. Spin HMDS/photoresist. Pre/post bake as indicated.

EXPO DIALOG

( « represents the Enter key )

:EXPO filename 1st part  filename 2nd part « *************************************
YOUR JOB COMMENT IS DISPLAYED HERE
*************************************
STARTING ROW: 1st array row «
ENDING ROW: last array row «
STARTING COLUMN: 1st array column «
ENDING COLUMN: last array column «
OVER ARRAY OR ROW: A or R «
STARTING EXPOSURE (SEC): initial exposure time «
INCREMENTAL EXPOSURE (SEC): exposure time increments «
STARTING FOCUS: initial focus setting «
INCREMENTAL FOCUS: focus setting increments «

START AWH

This is the prompt to begin alignment with the button box controls as detailed in the wafer alignment section of the Mann Stepper Alignment Page. Joystick alignment is omitted because this is a full-size wafer on a first-level pass, with standard alignment dice specified in the source job file.

After the expo pass is complete, there will be prompts to input the row and column of the best exposed die. As this data is unknown until after microscopic inspection of the exposure matrix, just enter any random row and column data to exit the expo pass routine.